UCB TCAD Process Technology NotesNILS and SensitivityMaintained by Professor Andy Neureuther email neureuth@eecs.berkeley.eduHome Page | About_PTN | Lithography | References | LAVA | Flow | TCAD | Dep_Etch | Ox_Dif_Imp | SPC_DOE | NILS/Sensitivity |
NILS viewed as Normalized Sensitivity