MICHAEL A. LIEBERMAN

Lieberman Photo

 

Professor in the Graduate School
Department of Electrical Engineering and Computer Sciences
Room 261M Cory Hall
University of California at Berkeley
Berkeley, CA 94720-1770, U.S.A.

Office phone: 510-643-6632
Fax: 510-643-7846 lieber@eecs.berkeley.edu

Administrative assistant: Lea Barker ,
253 Cory Hall, leab@eecs.berkeley.edu,
Tel +1 (510) 642-2348, Fax +1 (510) 643-7846

RESEARCH
Research Interests
Talks
Resume
List of Publications

TEACHING
Courses

Textbook: Regular and Chaotic Dynamics

Textbook: Principles of Plasma Discharges and Materials Processing
   First Edition Errata:   download pdf file
   Second Edition Errata:  download pdf file
   Chinese Language Errata:  download pdf file

Research Interests

Research interests are in the area of PLASMA-ASSISTED MATERIALS PROCESSING AND PROCESSING DISCHARGES: How do you dig a trench 200 atoms wide and 2000 atoms deep in a silicon wafer? How do you dope the trench or fill it with metal? Chemically reactive plasma discharges are the essential tools to do these, and are widely used in the semiconductor and flat panel display industries for etching and deposition processes. Their use has become critical for VLSI circuit and thin film transistor (TFT) production. High frequency, and confined dual frequency capacitively-coupled plasma sources are playing an increasing role in processing as feature sizes shrink and wafer and TFT substrate sizes increase. With both high and low frequency drives, independent control of ion flux and ion bombarding energy can be achieved. Confinement of the plasma to the main discharge region, and electromagnetic effects such as standing waves and skin effects, can have detrimental effects on processing uniformity.

Current research is supported by the Lam Research Corporation, the State of California MICRO and UC Discovery Programs, and California industries, and is collaborative with Professors D.B. Graves, J.P. Verboncoeur, and A.J. Lichtenberg. A list of current projects follows:

  1. Particle-in-cell computer simulations to determine ion and fast neutral energy and angular distributions on the wafer in multi-frequency driven capacitive reactors
  2. Development of fast algorithms to estimate the ion and fast neutral energy and angular distributions on the wafer surface
  3. Theory and fluid simulations of standing wave and skin effects in high frequency inductive and capacitive discharges
  4. Theory and 1- and 2D particle-in-cell simulations of combined RF- and DC-driven capacitive discharges; secondary electron energy and angular distributions on the wafer surface with/without DC enhancement
  5. Theory and 2D particle-in-cell simulations of double layer formation in electropositive and electronegative discharges
  6. Theory and 2D particle-in-cell simulations of magnetized electronegative discharges

 

Talks

Hybrid Global Model Simulations of He/N2 and He/H2O Atmospheric Pressure Capacitive Discharges   (1.1 MB pdf file, 15 min talk at the Gaseous Electronics Converence, Raleigh, NC, 3 - 7 November 2014)

The Emergence of Plasma Processing   (700 KB pdf file, 35 min invited talk at the American Vacuum Society 60th International Symposium and Exhibition, Long Beach, CA, 27 October - 1 November 2013)

Introduction to Gas Discharges and Plasma Processing   (2.1 MB pdf file, 4 hour preconference tutorial at the 66th Gaseous Electronics Conference, Princeton, NJ, 28 September - 4 October 2013)

Narrow Gap Electronegative Capacitive Discharges and Stochastic Heating   (970 kB pdf file, 40 min talk at the 4th RF Workshop emphasizing stochastic heating, 29-31 May 2013, Giens, France)

Narrow Gap Electronegative Capacitive Discharges and Stochastic Heating   (700 kB pdf file, 25 min talk at the DOE Plasma Science Center Annual Meeting, 15-16 May 2013, College Park, MD); ( Powerpoint version, 1.4 MB)

Modeling Plasma Processing Discharges   (556 kB pdf file, 30 min talk at the DOE Plasma Science Center Annual Meeting, 17-18 May 2012, Princeton, NJ)

Fast Analytical/Numerical Model of Atmospheric Pressure Radio-Frequency Capacitive Discharges   (0.6 MB pdf file, 25 min invited talk at the 64th Gaseous Electronics Conference, Salt Lake City, Utah, 14-18 November 2011)

A Mini-Course on the Principles of Low-Pressure Discharges and Materials Processing   (2.1 MB pdf file, 4 hour short course at the 15th European Summer School on Low Temperature Plasma Physics, Bad Honnef, Germany, 10-16 October 2010)

Plasma Processing for Nanoelectronics --- History and Prospects   (2.3 MB pdf file, 30 min invited talk at the 63rd Gaseous Electronics Conference, Paris, France, 4-8 October 2010)

Sheath Dynamics and Energetic Particle Distributions on Substrates   (1.7 MB pdf file, 30 min invited talk at the 10th Asia-Pacific Conference on Plasma Science and Technology, 6 July 2010, Jeju Island, Korea)

A Mini-Course on the Principles of Low-Pressure Discharges and Materials Processing   (2.1 MB pdf file, 4 hour short course at the 10th Asia-Pacific Conference on Plasma Science and Technology, 4 July 2010, Jeju Island, Korea)

Kinetic Effects in Plasma Processing Discharges   (1.7 MB pdf file, 15 min talk at the DOE Plasma Science Center Annual Meeting, 10-11 May 2010, Ann Arbor, MI)

Sheath Dynamics and Energetic Particle Distributions on Substrates   (880 KB pdf file, 25 min invited talk at the 62nd Gaseous Electronics Conference, 20-23 September 2009, Saratoga Springs, NY)

Adventures in Two-Dimensional Particle-In-Cell Simulations of Electronegative Discharges: (1) Double Layers in a Two-Region Discharge; (2) Transport in a Magnetized Discharge   (500 KB pdf file, 1 hour talk at Ecole Polytechnique, France, 24 September 2009

Double Layer Formation in a Two Region Electronegative Discharge   (360 KB pdf file, 20 minute contributed talk at the 19th International Symposium on Plasma Chemistry, Bochum, Germany, 26-31 July 2009; also, 424 KB animated gif file showing unstable slow and fast waves generated downstream and traveling upstream into the double layer)

Recent Progress on the Physics of Capacitive Discharges   (2.0 MB pdf file, 45 minute plenary talk at the 9th Asia-Pacific Conference on Plasma Science and Technology, Huangshan, China, 8-11 October 2008);    Recent Progress on the Physics of Capacitive Discharges  (1 hour extended version, 2.2 MB pdf file)

Nanoelectronics and Plasma Processing - The Next 15 Years and Beyond   (2.3 MB pdf file, One hour colloquium at Princeton Plasma Physics Laboratory, Princeton, NJ, 31 October 2007)

A Mini-Course on the Principles of Low-Pressure Discharges and Materials Processing   (1.4 MB pdf file, 3 hour lecture, IUPAC Summer School on Plasma Chemistry for Materials Processing, Kyoto, Japan, 23-25 August 2007; 4 hour lecture, 12th European Summer School on Low Temperature Plasma Physics, Bad Honnef, Germany, 6-11 October 2007)

Capacitive Discharges Driven by Combined DC/RF Sources   (1.9 MB pdf file, contributed 15 minute talk at the 60th Gaseous Electronics Conference, Arlington, VA, 2-5 October 2007)

Modeling and Simulation of Electromagnetic Effects in Capacitive Discharges   (504 kB pdf file, poster presentation at the 60th Gaseous Electronics Conference, Arlington, VA, 2-5 October 2007)

Recent Progress on the Physics of Capacitive Discharges   (3.5 MB pdf file, Invited talk at the Workshop on Radio Frequency Discharges, All Hallows College, Dublin, Ireland, 11-13 June 2007)

Nanoelectronics and Plasma Processing - The Next 15 Years and Beyond   (2 MB pdf file, Allis Prize invited half-hour talk at the 2007 Meeting of the Division of Atomic, Molecular and Optical Physics, American Physical Society, Calgary, Alberta, Canada, June 5 - 9, 2007)

Fermi Acceleration - From Cosmic Rays to Discharge Heating   (867 kB pdf file, Allis Prize 20 minute invited talk at the 48th Annual Meeting, Division of Plasma Physics, American Physical Society, October 30 - November 3, 2006)

Nanoelectronics and Plasma Processing - The Next 15 Years and Beyond   (452 kB pdf file, Allis Prize one hour talk at the 59th Gaseous Electronics Conference, Columbus, OH, 9-13 October 2006)

Plasma, Sheaths, and Surfaces - The Discharge Science of Irving Langmuir   (5.4 MB pdf file, Foundation Talk at the 58th Gaseous Electronics Conference, San Jose, CA, 16-20 October 2005)

Plasma Processing in the 21st Century   (15.4 MB pdf file, general talk for graduate students)

Plasma Processing in the 21st Century   (9.5 MB pdf file, advanced talk including a thorough presentation of dual/high frequency capacitive discharge physics)

Fermi Acceleration Revisited - From Cosmic Rays to Discharge Heating   (3.9 MB pdf file, one hour historical talk on stochastic heating)

Ignition Conditions for Peripheral Plasma in a Grounded Chamber Connected to a Dual Frequency Capacitive Discharge   (0.9 MB pdf file, breakdown issues in capacitive discharges)

 

Resume

Michael A. Lieberman received his B.S. and M.S. degrees from the Massachusetts Institute of Technology in 1962 and his Ph.D. degree from Massachusetts Institute of Technology in 1966. He joined the Department of Electrical Engineering and Computer Sciences (EECS) at Berkeley in 1966. In 1971, he received the Distinguished Teaching Award of the Berkeley campus. He was a Guggenheim Fellow during 1972-3. He is a Fellow of the American Physical Society (APS), the American Association for the Advancement of Science (AAAS), the Institute of Electrical and Electronic Engineers (IEEE), the American Vacuum Society, and the Institute of Physics (Great Britain). He received the IEEE Plasma Science and Applications Award in 1995, the von Engel Prize of the International Union of Pure and Applied Physics in 2005, and the American Physical Society Will Allis Prize for Study of Ionized Gases in 2006.

Professor Lieberman's research interests are plasma processing of materials, plasma modeling and diagnostics. He has also collaborated with Prof. A.J. Lichtenberg on research in nonlinear dynamics. His monograph, co-authored with A.J. Lichtenberg, Regular and Stochastic Motion, was published by Springer-Verlag in 1983. A second edition, Regular and Chaotic Dynamics, was published in 1991. His latest book, also co-authored with A.J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, was published by John Wiley and Sons in 1994. An expanded second edition was published in 2005, a Chinese language edition in 2007, and a Japanese language edition in 2010. Erratas for both the first and second editions are available (see above):

Courses

Course EE 239, "Weakly Ionized Plasmas," is normally taught once every two years, and was last taught in Spring Semester 2009. The text used is M.A. Lieberman and A.J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, Second Edition, John Wiley and Sons, 2005.