My current research is the hardware implementation of Maskless Lithography.
We investigate hardware implementation of the data path compression algorithms in mask-less lithography. As the physical size of semiconductor devices become smaller, the traditional optical lithography techniques become impractical due to the physical constraints of the mask material. To solve this problem, direct-write maskless lithography approaches are under consideration.
To achieve acceptable throughput with mask-less lithography, we have to deal with the data rates of 10Tb/s, and as such, data compression techniques need to be applied. Specifically, the layout data is compressed beforehand, sent to the writer, and decompressed inside the writer to generate actual pixel values.
Vito Dai has developed a lossless compression scheme, called C4, for layout that outperforms all other lossless compression techniques such as LZ and its variations. In this project, we consider hardware implementation aspects of the decoder for the C4 algorithm and its variations. Our approach is to first develop the hardware block diagram model of decoder, and then test the performance on FPGA board. The final goal is to build a decoder chip for C4.
References:
H. Liu, V. Dai, A. Zakhor and B. Nikolic, "Reduced Complexity Compression Algorithms for Direct-Write Maskless Lithography Systems," SPIE Journal of Microlithography, MEMS, and MOEMS (JM3), Vol. 6, 013007, Feb. 2, 2007. [Adobe PDF]
H. Liu, V. Dai, A. Zakhor and B. Nikolic, "Reduced Complexity Compression Algorithms for Direct-Write Maskless Lithography Systems", in Emerging Lithographic Technologies X, Proceedings of SPIE, San Jose, California, Vol. 6151, 61512B-12, March 2006. [Adobe PDF]
V. Dai and A. Zakhor, "Advanced Low-complexity Compression for Maskless Lithography Data" in Emerging Lithographic Technologies VIII, Proceedings of the SPIE, San Jose, California, Vol. 5374, No. 1, February 2004, pp. 610-618. [Adobe PDF]
B. Nikolić, B. Wild, V. Dai, Y. Shroff, B. Warlick, A. Zakhor, and W. G. Oldham, "Layout Decompression Chip for Maskless Lithography" in Emerging Lithographic Technologies VIII, Proceedings of the SPIE, San Jose, California, Vol. 5374, No. 1, February 2004, pp. 1092-1099. [Adobe PDF]