I am a graduate student studying electrical engineering at the University of California - Berkeley.  I am in Professor Andrew Neureuther’s research group.  My main research area is extreme ultraviolet (EUV) lithography, specifically EUV masks with buried defects.  My most important contribution to date is a new simulator called RADICAL (Rapid Absorber Defect Interaction Computation for Advanced Lithography).  I am currently using this simulator to further understanding of EUV defects and develop compensation techniques to reduce their effects.