PIC Simulation of Magnetized DC Discharges

Jeffrey Hammel
(Professor John Verboncoeur --NE)
Benet Army Labs

Magnetized DC discharges are used in plasma processing for sputtering deposition. Enhanced confinement of electrons is achieved using permanent magnets for magnetron configurations. While such processes are commonly used, the physics are complex and substantial deviations from analytic models are often seen, when such models are even available.

Using a kinetic description of plasmas including collisions with neutrals, particle-in-cell (PIC) methods will be used to accurately model DC discharges, both magnetized and unmagentized. Insight will be gained into the ion energy and angular distributions at the cathode, important to the sputtering deposition process.

Figure 1: Depiction of a DC discharge

M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, John Wiley, New York, 1994.

More information (http://ptsg.eecs.berkeley.edu) or

Send mail to the author : (jhammel@eecs.berkeley.edu)

Edit this abstract