List of Abstracts for Andrew R. Neureuther

The EECS Research Summary for 2003

Measuring Optical Image Aberrations with Pattern and Probe Based Targets Garth Robins
A Pattern Matcher for Locating Areas in Lithographic Masks Sensitive to Lens Aberrations Frank E. Gennari
Polarization Masks: Monitors and High-Resolution Structures Michael Lam
Enhanced Quantitative Analysis of Resist Image Contrast upon Line Edge Roughness (LER) Mike Williamson
Immersion Lithography Scott Hafeman
(5 abstracts total)