Research Projects - Integrated Modeling Process and Computation for Technology (IMPACT)
Small Projects
- A Comprehensive Model of Process Variability for Statistical Timing Optimization
Kun Qian and Costas J. Spanos - Characterization and monitoring of photomask edge effects
Marshal Miller and Andrew R. Neureuther - Engineered High Mobility CMOS Substrates
Haiyan Jin and Nathan W. Cheung - Fast 3D Simulation and Compensation for Buried Defects in Extreme Ultraviolet Masks with Absorber Features (RADICAL)
Chris Heinz Clifford and Andrew R. Neureuther - Impact of Line Edge Roughness on Tri-Gate Bulk MOSFET Performance
Xin Sun and Tsu-Jae King Liu - MOSFET Stress Modeling Using Pattern Functions
Andrew R. Neureuther, Tsu-Jae King Liu, Nuo Xu and Lynn Tao-Ning Wang - Zero-Footprint Optical Metrology Wafer
John Gerling and Nathan W. Cheung
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