Technical Reports - Andrew R. Neureuther

Impact of photomask quadrature edge effects through focus (EECS-2008-133)
Marshal Miller, Andrew R. Neureuther, Daniel Ceperley and Koji Kikuchi

SPLAT v5.0 User's Guide (M95/13)
D. Lee, D. Newmark, K. Toh, P. Flanner and Andrew R. Neureuther

White Paper Concurrent Circuit Design/ Process Engineering in a Flexible Manufacturing Environment (M93/91)
Andrew R. Neureuther, Costas J. Spanos, M. Hatzilambrou and C. Yu

Investigation of Process Technology Elements (M91/66)
William G. Oldham and Andrew R. Neureuther

Test Structures for the Electrical Characterization of Optical Lithography (M88/39)
Andrew R. Neureuther, William G. Oldham, R.C. Anderson, D.M. Drako, W.E. Haller, B. Huynh, D.E. Lyons, G.R. Misium, D.P. Sutija, K.K.H. Toh and B. Uathavikul

Test Structures for the Visual Characterization of Optical Lithography (M88/38)
Andrew R. Neureuther, William G. Oldham, R.C. Anderson, D.M. Drako, W.E. Haller, B. Huynh, D.E. Lyons, G.R. Misium, D.P. Sutija, K.K.H. Toh and B. Uathavikul

Berkeley CMOS Process: A User Guide (M84/84)
William G. Oldham, Andrew R. Neureuther, Y. Shacham and F. Dupois

Berkeley CMOS Process Test Patterns (M84/26)
William G. Oldham, Andrew R. Neureuther and Y. Shacham

Compensation for Lithography Induced Process Variations during Physical Design (EECS-2011-36)
Eric Chin

Defocus based phase imaging for quantifying electromagnetic edge effects in photomasks (EECS-2014-105)
Aamod Shanker

Measurement and characterization of EUV mask performance at high-NA (EECS-2013-56)
Rikon Chao