Technical Reports - Michael A. Lieberman

Ignition Conditions for Peripheral Plasma in a Grounded Chamber Connected to a Dual Frequency Capactive Discharge (M05/10)
Michael A. Lieberman, Allan J. Lichtenberg, S. Kim and J. T. Gudmunsson

Effect of Ar Addition to an O2 Plasma in a Large Area Plasma Source: O2/Ar Mixture Plasma Modeling and Photoresist Etching (M01/1)
K. Takechi and Michael A. Lieberman

Effect of Ion Energy on Photoresist Etching in an Inductively Coupled Large Area Plasma Source (LAPS) (M00/58)
K. Takechi and Michael A. Lieberman

Kinetics of Photoresist Etching in a Large Area Plasma Source (LAPS) (M00/40)
K. Takechi and Michael A. Lieberman

An Oxygen Discharge Model for a Large Area Plasma Source (LAPS) (M00/33)
K. Takechi and Michael A. Lieberman

Operation of a Large Area Plasma Source (LAPS) with Oxygen Gas (M00/15)
K. Takechi and Michael A. Lieberman

Ion Energy Distributions in RF Sheaths; Review, Analysis and Simulation (M98/62)
E. Kawamura, V. Vahedi, Michael A. Lieberman and Charles K. (Ned) Birdsall

A Traveling Wave Driven, Inductively Coupled Large Area Plasma Source (M97/68)
Y. Wu and Michael A. Lieberman

From Fermi Acceleration to Collisionless Discharge Heating (M97/65)
Michael A. Lieberman and V.A. Godyak

Global Model for High Pressure Electronegative Radio-Frequency Discharges (M96/23)
Y.T. Lee, Michael A. Lieberman, Allan J. Lichtenberg, F. Bose, H. Baltes and R. Patrick

RF Plasma Potential and Surface Temperature Measurements in an Inductively Coupled Plasma Source (M96/14)
G. Gregori and Michael A. Lieberman

A Simple Transformer Model Applied to a Planar Inductive Plasma Discharge (M96/3)
J.T. Gudmundsson and Michael A. Lieberman

Measurement of Synchronization in Noisy and Chaotic Dynamical Systems (M95/103)
P. Khoury, Michael A. Lieberman and Allan J. Lichtenberg

Modeling Electronegative Discharges at Low Pressure (M95/97)
I. Kouznetsov, Allan J. Lichtenberg and Michael A. Lieberman

Global Models of Pulse-Power Modulated High Density, Low Pressure Discharges (M95/83)
Michael A. Lieberman and S. Ashida

Simulation and Analysis of a Large Area Plasma Source (M95/65)
V.P. Gopinath and Michael A. Lieberman

Experimental Modeling of a Traveling-Wave- Excited Inductively Driven Coil for a Large Area Plasma Source for Flat Panel Processing (M95/60)
Y. Wu and Michael A. Lieberman

Review of Ion Energy Distributions in Capacitively Coupled RF Plasma Reactors (M95/49)
E. Kawamura, V. Vahedi, Michael A. Lieberman and Charles K. (Ned) Birdsall

Role of Etch Products in Polysilicon Etching in a High Density Chlorine Discharge (M95/9)
C. Lee, D.B. Graves and Michael A. Lieberman

Characterization at Different Aspect Ratios (Radius/Length) of a Radio Frequency Inductively Coupled Plasma Source (M94/56)
P.N. Wainman, Michael A. Lieberman, Allan J. Lichtenberg, R.A. Stewart and C. Lee

Spatially Averaged (Global) Model of the Time Modulated High Density Argon Plasmas (M94/50)
S. Ashida, Michael A. Lieberman and C. Lee

Global Model of Ar, O_2, Cl_2, and Ar/O_2 High Density Plasma Discharges (M94/49)
C. Lee and Michael A. Lieberman

Time Scale to Ergodicity in the FPU System (M93/92)
J. De Luca, Allan J. Lichtenberg and Michael A. Lieberman

Modeling Electronegative Plasma Discharges (M93/74)
Allan J. Lichtenberg, V. Vahedi, Michael A. Lieberman and T. Rognlien

Global Model of Plasma Chemistry in a High Density Oxygen Discharge (M93/54)
C. Lee, D.B. Graves, Michael A. Lieberman and D.W. Hess

Arnold Diffusion in Many Dimensions (M93/13)
B.P. Wood, Allan J. Lichtenberg and Michael A. Lieberman

Design of High Density Plasma Sources for Materials Processing (M93/3)
Michael A. Lieberman and R.A. Gottscho

Verification of Frequency Scaling Laws for Capacitive RF Discharges Using Two- Dimensional Simulations (M92/146)
V. Vahedi, Charles K. (Ned) Birdsall, Michael A. Lieberman, G. DiPeso and T.D. Rognlien

Analytic Model of the Ion Angular Distribution in a Collisional Sheath (M92/114)
V. Vahedi, R.A. Stewart and Michael A. Lieberman

Plasma and Gas Phase Kinetics of High Density SF_6 Discharges (M92/95)
C. Lee, D.W. Hess and Michael A. Lieberman

On Synchronization of Regular and Chaotic Systems (M92/72)
M. de Sousa Vieira, Allan J. Lichtenberg and Michael A. Lieberman

RF Discharge Impedance Measurements and Comparison to a Discharge Model (M92/34)
A.H. Sato and Michael A. Lieberman

Electron Cyclotron Resonance Etching of Silylated Photoresist (M92/25)
B. Lynch, S. Das, Michael A. Lieberman and D.W. Hess

Self-Synchronization of Many Coupled Oscillators (M92/20)
M. de Sousa Vieira, Allan J. Lichtenberg and Michael A. Lieberman

Numerical and Experimental Studies of Self-Synchronization and Synchronized Chaos (M92/5)
M. de Sousa Vieira, P. Khoury, Allan J. Lichtenberg, Michael A. Lieberman, W. Wonchoba, J. Gullicksen, J.Y. Huang, R. Sherman and M. Steinberg

Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Fourth Quarterly Progress Report (M91/116)
Nathan W. Cheung, Michael A. Lieberman, C.A. Pico, R.A. Stewart, J. Tao, M.H. Kiang, C. Yu, V. Vahedi, B. Troyanovsky, W. En, E. Jones and J. Benasso

Self-Consistent Electron Cyclotron Resonance Absorption in a Plasma with Varying Parameters (M91/114)
M.C. Williamson, Allan J. Lichtenberg and Michael A. Lieberman

Plasma Etching of CVD Tungsten Using ECR Discharges (M91/92)
C. Lee, D.W. Hess and Michael A. Lieberman

Secure Communications by Synchronization to a Chaotic Signal (M91/89)
J. Gullicksen, M. de Sousa Vieira, Michael A. Lieberman, R. Sherman, Allan J. Lichtenberg, J.Y. Huang, W. Wonchoba, M. Steinberg and P. Khoury

Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Third Quarterly Progress Report (M91/86)
Michael A. Lieberman, Nathan W. Cheung, C.A. Pico, R.A. Stewart, J. Tao, M.H. Kiang, C. Yu, V. Vahedi, B. Troyanovsky, W. En, E. Jones and J. Benasso

A Two-Coupled-Sheath Model for the Conduction of Current Through Asymmetric Parallel Plate RF Discharges (M91/81)
A.H. Sato and Michael A. Lieberman

Chaos and the Approach to Equilibrium in the Discrete Sine-Gordon Equation (M91/76)
C.G. Goedde, Allan J. Lichtenberg and Michael A. Lieberman

Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Second Quarterly Progress Report (M91/63)
Michael A. Lieberman

Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing (M91/26)
Michael A. Lieberman and Nathan W. Cheung

Model of Plasma Immersion Ion Implantation for Voltage Pulses with Finite Rise- and Fall-Times (M91/14)
R.A. Stewart and Michael A. Lieberman

Nonlinear Dynamics of Self-Synchronizing Systems (M91/6)
M. de Sousa Vieira, Allan J. Lichtenberg and Michael A. Lieberman

Effects of DC Bias on the Kinetics and Electrical Properties of Silicon Dioxide Grown in an Electron Cyclotron Resonance Plasma (M91/5)
D.A. Carl, D.W. Hess, Michael A. Lieberman, T.D. Nguyen and R. Gronsky

Characterization of the Processing Plasma in an Engineering Prototype Reactor for Plasma Immersion Ion Implantation (M90/100)
R.A. Stewart, X.Y. Qian, D.A. Carl, B. Lake, J. Benasso, R. Lynch, C.A. Pico, Michael A. Lieberman and Nathan W. Cheung

Plasma Immersion Ion Implantation for VLSI Fabrication (M90/84)
X.Y. Qian, Nathan W. Cheung and Michael A. Lieberman

Sheath Motion in a Capacitively Coupled Radio Frequency Discharges (M90/83)
B.P. Wood, Michael A. Lieberman and Allan J. Lichtenberg

Axial RF Electric Field Intensity and Ion Density During Low to High Mode Transition in Argon Electron Cyclotron Resonance Discharges (M90/81)
D.A. Carl, M.C. Williamson, Michael A. Lieberman and Allan J. Lichtenberg

A One Dimensional Collisional Model for Plasma Immersion Ion Implantation (M90/60)
V. Vahedi, Michael A. Lieberman, M.V. Alves, J.P. Verboncoeur and Charles K. (Ned) Birdsall

Model of Magnetically Enhanced Capacitive RF Discharges (M90/58)
Michael A. Lieberman, Allan J. Lichtenberg and S.E. Savas

Sheath Voltage Ratio for Asymmetric RF Discharges (M90/56)
M.V. Alves, Michael A. Lieberman, V. Vahedi and Charles K. (Ned) Birdsall

Electron Beam Probe Measurements of Electric Fields in RF Discharges (M90/49)
A.H. Sato and Michael A. Lieberman

Arnold Diffusion in Weakly Coupled Standard Maps (M90/42)
B.P. Wood, Allan J. Lichtenberg and Michael A. Lieberman

Kinetics of Photoresist Etching in an Electron Cyclotron Resonance Plasma (M90/25)
D.A. Carl, D.W. Hess and Michael A. Lieberman

Plasma Immersion Ion Implantation for Impurity Gettering in Silicon Plasma Immersion Ion Implantation and Dose Loss in Impurity Gettering Experiment (M90/23)
H. Wong, X.Y. Qian, D. Carl, Nathan W. Cheung, Michael A. Lieberman, I.G. Brown and K.M. Yu

Theory of a Helical Resonator Plasma Source (M90/10)
Michael A. Lieberman, Allan J. Lichtenberg and D.L. Flamm

Bias Voltage in Finite Length, Cylindrical and Coaxial RF Discharges (M89/121)
Michael A. Lieberman and S.E. Savas

Oxidation of Silicon in an ECR Oxygen Plasma: Kinetics, Physico-Chemical and Electrical Properties (M89/98)
D.A. Carl, D.W. Hess and Michael A. Lieberman

Parametric Instabilities in the Discrete Sine-Gordon Equation (M89/79)
C.G. Goedde, Allan J. Lichtenberg and Michael A. Lieberman

Secure Random Number Generation Using Chaotic Circuits (M89/38)
G.M. Bernstein and Michael A. Lieberman

Model of Plasma Immersion Ion Implantation (M89/30)
Michael A. Lieberman

Macroscopic Modelling of R.F. Plasma Discharges (M88/86)
G.R. Misium, Allan J. Lichtenberg and Michael A. Lieberman

Cavity Perturbation Measurement of Plasma Density in Complex Geometry R.F. Discharges (M88/81)
R.M. Moroney, Allan J. Lichtenberg and Michael A. Lieberman

Spherical Shell Model of an Asymmetric R.F. Discharge (M88/65)
Michael A. Lieberman

Dynamics of a Collisional Capacitive R.F. Sheath (M88/62)
Michael A. Lieberman

Rays and Waves in a Periodically Perturbed Parallel Plate Waveguide (M88/59)
R.P. Ratowsky and Michael A. Lieberman

Self-Consistent Stochastic Electron Heating in Radio Frequency Discharges (M88/29)
C.G. Goedde, Allan J. Lichtenberg and Michael A. Lieberman

Axial Distribution of Optical Emission in a Planar Magnetron (M88/6)
L. Gu and Michael A. Lieberman

Diffusion in Two Dimensional Mappings (M88/5)
Allan J. Lichtenberg and Michael A. Lieberman

A Method for Obtaining a Canonical Hamiltonian for Nonlinear LC Circuits (M88/2)
G.M. Bernstein and Michael A. Lieberman

Analytical Solution for Capacitive R.F. Sheath (M87/71)
Michael A. Lieberman

Radial Current Distribution at a Planar Magnetron Cathode (M87/66)
A.E. Wendt, Michael A. Lieberman and H. Meuth

Basic RF Discharge Model (M87/65)
Michael A. Lieberman

Nonlinear Dynamics of a Digital Phase Locked Loop (M87/59)
G.M. Bernstein, Michael A. Lieberman and Allan J. Lichtenberg

Transient Electrostatic Potentials Driven by Short-Pulse Electron Cyclotron Heating (M87/17)
Allan J. Lichtenberg, Michael A. Lieberman and R.H. Cohen

Collisional Treatment of the Trapped Particle Mode in Multi-Region Mirror Systems (M87/16)
H. Ramachandran, Allan J. Lichtenberg, Michael A. Lieberman and A.K. Sen

Electron Beam Time-of-Flight Potential Diagnostic (M87/4)
B.T. Archer, H. Meuth and Michael A. Lieberman

Axial Feedback Stabilization of Flute Modes for Mirror Machines (M86/101)
B.K. Kang, Michael A. Lieberman and A.K. Sen

The Effect of Quasi-Accelerator Modes on Diffusion (M86/100)
Allan J. Lichtenberg, Michael A. Lieberman and N.W. Murray

Stochasticity and Resonances in the Two Beam Accelerator (M86/76)
N.W. Murray and Michael A. Lieberman

Observation of a Potential Barrier Created by Electron Cyclotron Resonance Heating in a Multiple Mirror Plasma (M86/68)
C.P. Chang, H. Meuth, Michael A. Lieberman and Allan J. Lichtenberg

Experimental Observation of Wall Stabilization of Axisymmetric Mirrors at High Beta (M86/7)
R.M. Close, B.K. Kang, Allan J. Lichtenberg, Michael A. Lieberman and H. Meuth

Many-Dimensional Hamiltonian Systems (M85/74)
Michael A. Lieberman

Transient Chaotic Distributions in Dissipative Systems (M85/56)
K.Y. Tsang and Michael A. Lieberman

Observation of a Curvature Driven, Trapped Particle Mode Created by a Potential Barrier (M85/41)
J.C. Fernandez, C.P. Chang, Allan J. Lichtenberg, Michael A. Lieberman and H. Meuth

Synchronous Electron Beam Diagnostic for Plasma Etching Discharges (M85/38)
C.P. Chang and Michael A. Lieberman

Time-of-Flight He+ Beam Potential Diagnostic in Tandem Mirror (M85/34)
B.T. Archer and Michael A. Lieberman

Transient Chaos in Dissipatively Perturbed Near-Integrable Hamiltonian Systems (M85/26)
Michael A. Lieberman and K.Y. Tsang

Swept-Frequency, 8mm Microwave Interferomete for MXX (M84/104)
B.T. Archer, H. Meuth and Michael A. Lieberman

Corrections to Quasilinear Diffusion in Area Preserving Maps (M84/102)
N.W. Murray, Michael A. Lieberman and Allan J. Lichtenberg

Electron Beam Time-of-Flight Measurements of Plasma Potential in Tandem Mirrors (M84/92)
Michael A. Lieberman and C-P. Chang

Axial Feedback Stabilization of Flute Modes for Mirror Machines (M84/61)
B.K. Kang, Michael A. Lieberman and A.K. Sen

A Theoretical Study of ICRF Effects on Multiple Mirror Confinement (M84/19)
K.J. Doniger, Michael A. Lieberman and Allan J. Lichtenberg

Invariant Distribution on Strange Attractors in Highly Dissipative Systems (M84/13)
K-Y. Tsang and Michael A. Lieberman

Collisionless Diffusion in Two-Frequency Electron Cyclotron Resonance Heating (M83/65)
J.E. Howard, Allan J. Lichtenberg, Michael A. Lieberman and R.H. Cohen

Potential Barrier Decoupling of Stable and Unstable Regions of Average Minimum B Magnetic Mirrors (M83/22)
J. Fernandez, Allan J. Lichtenberg, Michael A. Lieberman and N. Benjamin

Analytical Calculation of Invariant Distributions on Strange Attractors (M83/19)
K.Y. Tsang and Michael A. Lieberman