Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

   

Technical Reports - Nathan W. Cheung

Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Fourth Quarterly Progress Report (M91/116)
Nathan W. Cheung, Michael A. Lieberman, C.A. Pico, R.A. Stewart, J. Tao, M.H. Kiang, C. Yu, V. Vahedi, B. Troyanovsky, W. En, E. Jones and J. Benasso

Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Third Quarterly Progress Report (M91/86)
Michael A. Lieberman, Nathan W. Cheung, C.A. Pico, R.A. Stewart, J. Tao, M.H. Kiang, C. Yu, V. Vahedi, B. Troyanovsky, W. En, E. Jones and J. Benasso

Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing (M91/26)
Michael A. Lieberman and Nathan W. Cheung

Characterization of the Processing Plasma in an Engineering Prototype Reactor for Plasma Immersion Ion Implantation (M90/100)
R.A. Stewart, X.Y. Qian, D.A. Carl, B. Lake, J. Benasso, R. Lynch, C.A. Pico, Michael A. Lieberman and Nathan W. Cheung

Plasma Immersion Ion Implantation for VLSI Fabrication (M90/84)
X.Y. Qian, Nathan W. Cheung and Michael A. Lieberman

Metal Vapor Vacuum Arc Ion Implantation for Seeding of Electroless Cu Plating (M90/82)
X.Y. Qian, M.H. Kiang, Nathan W. Cheung, I.G. Brown, X. Godechot, J.E. Galvin, R.A. MacGill and K.M. Yu

Plasma Immersion Ion Implantation for Impurity Gettering in Silicon Plasma Immersion Ion Implantation and Dose Loss in Impurity Gettering Experiment (M90/23)
H. Wong, X.Y. Qian, D. Carl, Nathan W. Cheung, Michael A. Lieberman, I.G. Brown and K.M. Yu

BERT - Circuit Electromigration Simulator (M90/3)
B.K. Liew, P. Fang, Nathan W. Cheung and Chenming Hu