Mask Roughness Induced LER in EUV Lithography
Brittany Marie McClinton
EECS Department
University of California, Berkeley
Technical Report No. UCB/EECS-2011-127
December 11, 2011
http://www.eecs.berkeley.edu/Pubs/TechRpts/2011/EECS-2011-127.pdf
Advisor: David T. Attwood
BibTeX citation:
@phdthesis{McClinton:EECS-2011-127,
Author = {McClinton, Brittany Marie},
Title = {Mask Roughness Induced LER in EUV Lithography},
School = {EECS Department, University of California, Berkeley},
Year = {2011},
Month = {Dec},
URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/2011/EECS-2011-127.html},
Number = {UCB/EECS-2011-127}
}
EndNote citation:
%0 Thesis %A McClinton, Brittany Marie %T Mask Roughness Induced LER in EUV Lithography %I EECS Department, University of California, Berkeley %D 2011 %8 December 11 %@ UCB/EECS-2011-127 %U http://www.eecs.berkeley.edu/Pubs/TechRpts/2011/EECS-2011-127.html %F McClinton:EECS-2011-127