Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Mask Roughness Induced LER in EUV Lithography

Brittany Marie McClinton

EECS Department
University of California, Berkeley
Technical Report No. UCB/EECS-2011-127
December 11, 2011

http://www.eecs.berkeley.edu/Pubs/TechRpts/2011/EECS-2011-127.pdf

Advisor: David T. Attwood


BibTeX citation:

@phdthesis{McClinton:EECS-2011-127,
    Author = {McClinton, Brittany Marie},
    Title = {Mask Roughness Induced LER in EUV Lithography},
    School = {EECS Department, University of California, Berkeley},
    Year = {2011},
    Month = {Dec},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/2011/EECS-2011-127.html},
    Number = {UCB/EECS-2011-127}
}

EndNote citation:

%0 Thesis
%A McClinton, Brittany Marie
%T Mask Roughness Induced LER in EUV Lithography
%I EECS Department, University of California, Berkeley
%D 2011
%8 December 11
%@ UCB/EECS-2011-127
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/2011/EECS-2011-127.html
%F McClinton:EECS-2011-127