Mask Roughness Induced LER in EUV Lithography

Brittany Marie McClinton

EECS Department
University of California, Berkeley
Technical Report No. UCB/EECS-2011-127
December 11, 2011

http://www.eecs.berkeley.edu/Pubs/TechRpts/2011/EECS-2011-127.pdf

Advisor: David T. Attwood


BibTeX citation:

@phdthesis{McClinton:EECS-2011-127,
    Author = {McClinton, Brittany Marie},
    Title = {Mask Roughness Induced LER in EUV Lithography},
    School = {EECS Department, University of California, Berkeley},
    Year = {2011},
    Month = {Dec},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/2011/EECS-2011-127.html},
    Number = {UCB/EECS-2011-127}
}

EndNote citation:

%0 Thesis
%A McClinton, Brittany Marie
%T Mask Roughness Induced LER in EUV Lithography
%I EECS Department, University of California, Berkeley
%D 2011
%8 December 11
%@ UCB/EECS-2011-127
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/2011/EECS-2011-127.html
%F McClinton:EECS-2011-127