First Principle-based State Estimator for Photolithography Control Using Full Profile Metrology

P. D. Friedberg

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M03/16
May 2003

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/ERL-03-16.pdf

BibTeX citation:

@techreport{Friedberg:M03/16,
    Author = {Friedberg, P. D.},
    Title = {First Principle-based State Estimator for Photolithography Control Using Full Profile Metrology},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {2003},
    Month = {May},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4085.html},
    Number = {UCB/ERL M03/16}
}

EndNote citation:

%0 Report
%A Friedberg, P. D.
%T First Principle-based State Estimator for Photolithography Control Using Full Profile Metrology
%I EECS Department, University of California, Berkeley
%D 2003
%@ UCB/ERL M03/16
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2003/4085.html
%F Friedberg:M03/16