Advanced Gate Stack Materials and Processes for Sub-100nm CMOS Appliciations
Qiang Lu
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M03/4
2003
Advisor: Chenming Hu
BibTeX citation:
@phdthesis{Lu:M03/4,
Author = {Lu, Qiang},
Title = {Advanced Gate Stack Materials and Processes for Sub-100nm CMOS Appliciations},
School = {EECS Department, University of California, Berkeley},
Year = {2003},
URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/2003/4052.html},
Number = {UCB/ERL M03/4}
}
EndNote citation:
%0 Thesis %A Lu, Qiang %T Advanced Gate Stack Materials and Processes for Sub-100nm CMOS Appliciations %I EECS Department, University of California, Berkeley %D 2003 %@ UCB/ERL M03/4 %U http://www.eecs.berkeley.edu/Pubs/TechRpts/2003/4052.html %F Lu:M03/4