Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

An Optical Metrology System for Lithography Process Monitoring and Control

Junwei Bao

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M03/2
2003

Advisor: Costas J. Spanos


BibTeX citation:

@phdthesis{Bao:M03/2,
    Author = {Bao, Junwei},
    Title = {An Optical Metrology System for Lithography Process Monitoring and Control},
    School = {EECS Department, University of California, Berkeley},
    Year = {2003},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/2003/4050.html},
    Number = {UCB/ERL M03/2}
}

EndNote citation:

%0 Thesis
%A Bao, Junwei
%T An Optical Metrology System for Lithography Process Monitoring and Control
%I EECS Department, University of California, Berkeley
%D 2003
%@ UCB/ERL M03/2
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/2003/4050.html
%F Bao:M03/2