Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Characterization of Systematic Spatial Variation in Photolithography

J. P. Cain

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M02/43
2002


BibTeX citation:

@techreport{Cain:M02/43,
    Author = {Cain, J. P.},
    Title = {Characterization of Systematic Spatial Variation in Photolithography},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {2002},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/2002/4043.html},
    Number = {UCB/ERL M02/43}
}

EndNote citation:

%0 Report
%A Cain, J. P.
%T Characterization of Systematic Spatial Variation in Photolithography
%I EECS Department, University of California, Berkeley
%D 2002
%@ UCB/ERL M02/43
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/2002/4043.html
%F Cain:M02/43