Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Full profile chemical mechanical polishing (CMP) metrology

Runzi Chang

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M01/23
2001


BibTeX citation:

@mastersthesis{Chang:M01/23,
    Author = {Chang, Runzi},
    Title = {Full profile chemical mechanical polishing (CMP) metrology},
    School = {EECS Department, University of California, Berkeley},
    Year = {2001},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/2001/9584.html},
    Number = {UCB/ERL M01/23}
}

EndNote citation:

%0 Thesis
%A Chang, Runzi
%T Full profile chemical mechanical polishing (CMP) metrology
%I EECS Department, University of California, Berkeley
%D 2001
%@ UCB/ERL M01/23
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/2001/9584.html
%F Chang:M01/23