Full profile chemical mechanical polishing (CMP) metrology
Runzi Chang
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M01/23
2001
BibTeX citation:
@mastersthesis{Chang:M01/23,
Author = {Chang, Runzi},
Title = {Full profile chemical mechanical polishing (CMP) metrology},
School = {EECS Department, University of California, Berkeley},
Year = {2001},
URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/2001/9584.html},
Number = {UCB/ERL M01/23}
}
EndNote citation:
%0 Thesis %A Chang, Runzi %T Full profile chemical mechanical polishing (CMP) metrology %I EECS Department, University of California, Berkeley %D 2001 %@ UCB/ERL M01/23 %U http://www.eecs.berkeley.edu/Pubs/TechRpts/2001/9584.html %F Chang:M01/23