Effect of Ar Addition to an O2 Plasma in a Large Area Plasma Source: O2/Ar Mixture Plasma Modeling and Photoresist Etching
K. Takechi and Michael A. Lieberman
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M01/1
2001
BibTeX citation:
@techreport{Takechi:M01/1,
Author = {Takechi, K. and Lieberman, Michael A.},
Title = {Effect of Ar Addition to an O2 Plasma in a Large Area Plasma Source: O2/Ar Mixture Plasma Modeling and Photoresist Etching},
Institution = {EECS Department, University of California, Berkeley},
Year = {2001},
URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/2001/3933.html},
Number = {UCB/ERL M01/1}
}
EndNote citation:
%0 Report %A Takechi, K. %A Lieberman, Michael A. %T Effect of Ar Addition to an O2 Plasma in a Large Area Plasma Source: O2/Ar Mixture Plasma Modeling and Photoresist Etching %I EECS Department, University of California, Berkeley %D 2001 %@ UCB/ERL M01/1 %U http://www.eecs.berkeley.edu/Pubs/TechRpts/2001/3933.html %F Takechi:M01/1