Extreme Ultraviolet (EUV) Holographic Metrology for Lithography Applications

Sang Hun Lee

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M00/63
December 2000

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/ERL-00-63.pdf

Advisor: Jeffrey Bokor

BibTeX citation:

@phdthesis{Lee:M00/63,
    Author = {Lee, Sang Hun},
    Title = {Extreme Ultraviolet (EUV) Holographic Metrology for Lithography Applications},
    School = {EECS Department, University of California, Berkeley},
    Year = {2000},
    Month = {Dec},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3926.html},
    Number = {UCB/ERL M00/63}
}

EndNote citation:

%0 Thesis
%A Lee, Sang Hun
%T Extreme Ultraviolet (EUV) Holographic Metrology for Lithography Applications
%I EECS Department, University of California, Berkeley
%D 2000
%@ UCB/ERL M00/63
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3926.html
%F Lee:M00/63