Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Extreme Ultraviolet (EUV) Holographic Metrology for Lithography Applications

Sang Hun Lee

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M00/63
2000

Advisor: Jeffrey Bokor


BibTeX citation:

@phdthesis{Lee:M00/63,
    Author = {Lee, Sang Hun},
    Title = {Extreme Ultraviolet (EUV) Holographic Metrology for Lithography Applications},
    School = {EECS Department, University of California, Berkeley},
    Year = {2000},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/2000/3926.html},
    Number = {UCB/ERL M00/63}
}

EndNote citation:

%0 Thesis
%A Lee, Sang Hun
%T Extreme Ultraviolet (EUV) Holographic Metrology for Lithography Applications
%I EECS Department, University of California, Berkeley
%D 2000
%@ UCB/ERL M00/63
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/2000/3926.html
%F Lee:M00/63