Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Effect of Ion Energy on Photoresist Etching in an Inductively Coupled Large Area Plasma Source (LAPS)

K. Takechi and Michael A. Lieberman

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M00/58
2000


BibTeX citation:

@techreport{Takechi:M00/58,
    Author = {Takechi, K. and Lieberman, Michael A.},
    Title = {Effect of Ion Energy on Photoresist Etching in an Inductively Coupled Large Area Plasma Source (LAPS)},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {2000},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/2000/3916.html},
    Number = {UCB/ERL M00/58}
}

EndNote citation:

%0 Report
%A Takechi, K.
%A Lieberman, Michael A.
%T Effect of Ion Energy on Photoresist Etching in an Inductively Coupled Large Area Plasma Source (LAPS)
%I EECS Department, University of California, Berkeley
%D 2000
%@ UCB/ERL M00/58
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/2000/3916.html
%F Takechi:M00/58