Effect of Ion Energy on Photoresist Etching in an Inductively Coupled Large Area Plasma Source (LAPS)

K. Takechi and Michael A. Lieberman

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M00/58
November 2000

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/ERL-00-58.pdf

BibTeX citation:

@techreport{Takechi:M00/58,
    Author = {Takechi, K. and Lieberman, Michael A.},
    Title = {Effect of Ion Energy on Photoresist Etching in an Inductively Coupled Large Area Plasma Source (LAPS)},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {2000},
    Month = {Nov},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3916.html},
    Number = {UCB/ERL M00/58}
}

EndNote citation:

%0 Report
%A Takechi, K.
%A Lieberman, Michael A.
%T Effect of Ion Energy on Photoresist Etching in an Inductively Coupled Large Area Plasma Source (LAPS)
%I EECS Department, University of California, Berkeley
%D 2000
%@ UCB/ERL M00/58
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3916.html
%F Takechi:M00/58