Spatially Resolved Optical Emission Spectroscopy for Plasma Etching

J-W. Lee

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M00/49
September 2000

http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/ERL-00-49.pdf

BibTeX citation:

@techreport{Lee:M00/49,
    Author = {Lee, J-W.},
    Title = {Spatially Resolved Optical Emission Spectroscopy for Plasma Etching},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {2000},
    Month = {Sep},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3888.html},
    Number = {UCB/ERL M00/49}
}

EndNote citation:

%0 Report
%A Lee, J-W.
%T Spatially Resolved Optical Emission Spectroscopy for Plasma Etching
%I EECS Department, University of California, Berkeley
%D 2000
%@ UCB/ERL M00/49
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/2000/3888.html
%F Lee:M00/49