Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

An Integrated System of Optical Metrology for Deep Submicron Lithography

Xinhui Niu

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M99/27
1999

Advisor: Costas J. Spanos


BibTeX citation:

@phdthesis{Niu:M99/27,
    Author = {Niu, Xinhui},
    Title = {An Integrated System of Optical Metrology for Deep Submicron Lithography},
    School = {EECS Department, University of California, Berkeley},
    Year = {1999},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1999/3656.html},
    Number = {UCB/ERL M99/27}
}

EndNote citation:

%0 Thesis
%A Niu, Xinhui
%T An Integrated System of Optical Metrology for Deep Submicron Lithography
%I EECS Department, University of California, Berkeley
%D 1999
%@ UCB/ERL M99/27
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1999/3656.html
%F Niu:M99/27