Moving Boundary Models and Methods for Deep Submicron Resist Process Simulation

E. Croffie

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M99/26
May 1999

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/ERL-99-26.pdf

BibTeX citation:

@techreport{Croffie:M99/26,
    Author = {Croffie, E.},
    Title = {Moving Boundary Models and Methods for Deep Submicron Resist Process Simulation},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1999},
    Month = {May},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/3655.html},
    Number = {UCB/ERL M99/26}
}

EndNote citation:

%0 Report
%A Croffie, E.
%T Moving Boundary Models and Methods for Deep Submicron Resist Process Simulation
%I EECS Department, University of California, Berkeley
%D 1999
%@ UCB/ERL M99/26
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1999/3655.html
%F Croffie:M99/26