Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Moving Boundary Models and Methods for Deep Submicron Resist Process Simulation

E. Croffie

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M99/26
1999


BibTeX citation:

@techreport{Croffie:M99/26,
    Author = {Croffie, E.},
    Title = {Moving Boundary Models and Methods for Deep Submicron Resist Process Simulation},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1999},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1999/3655.html},
    Number = {UCB/ERL M99/26}
}

EndNote citation:

%0 Report
%A Croffie, E.
%T Moving Boundary Models and Methods for Deep Submicron Resist Process Simulation
%I EECS Department, University of California, Berkeley
%D 1999
%@ UCB/ERL M99/26
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1999/3655.html
%F Croffie:M99/26