Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Investigation of Plasma Implantation and Gate Oxide Charging During Plasma Processing

Barry P. Linder

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M99/8
1999

Advisor: Nathan W. Cheung


BibTeX citation:

@phdthesis{Linder:M99/8,
    Author = {Linder, Barry P.},
    Title = {Investigation of Plasma Implantation and Gate Oxide Charging During Plasma Processing},
    School = {EECS Department, University of California, Berkeley},
    Year = {1999},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1999/3579.html},
    Number = {UCB/ERL M99/8}
}

EndNote citation:

%0 Thesis
%A Linder, Barry P.
%T Investigation of Plasma Implantation and Gate Oxide Charging During Plasma Processing
%I EECS Department, University of California, Berkeley
%D 1999
%@ UCB/ERL M99/8
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1999/3579.html
%F Linder:M99/8