OES-Based Sensing for Plasma Processing in IC Manufacturing
Roa Wen Chen
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M97/90
1997
Advisor: Costas J. Spanos
BibTeX citation:
@phdthesis{Chen:M97/90,
Author = {Chen, Roa Wen},
Title = {OES-Based Sensing for Plasma Processing in IC Manufacturing},
School = {EECS Department, University of California, Berkeley},
Year = {1997},
URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1997/3349.html},
Number = {UCB/ERL M97/90}
}
EndNote citation:
%0 Thesis %A Chen, Roa Wen %T OES-Based Sensing for Plasma Processing in IC Manufacturing %I EECS Department, University of California, Berkeley %D 1997 %@ UCB/ERL M97/90 %U http://www.eecs.berkeley.edu/Pubs/TechRpts/1997/3349.html %F Chen:M97/90