Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

OES-Based Sensing for Plasma Processing in IC Manufacturing

Roa Wen Chen

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M97/90
1997

Advisor: Costas J. Spanos


BibTeX citation:

@phdthesis{Chen:M97/90,
    Author = {Chen, Roa Wen},
    Title = {OES-Based Sensing for Plasma Processing in IC Manufacturing},
    School = {EECS Department, University of California, Berkeley},
    Year = {1997},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1997/3349.html},
    Number = {UCB/ERL M97/90}
}

EndNote citation:

%0 Thesis
%A Chen, Roa Wen
%T OES-Based Sensing for Plasma Processing in IC Manufacturing
%I EECS Department, University of California, Berkeley
%D 1997
%@ UCB/ERL M97/90
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1997/3349.html
%F Chen:M97/90