Understanding the Role of Mask and Resist in Line-End Shortening with Simulation

I. Lee

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M97/51
July 1997

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/ERL-97-51.pdf

BibTeX citation:

@techreport{Lee:M97/51,
    Author = {Lee, I.},
    Title = {Understanding the Role of Mask and Resist in Line-End Shortening with Simulation},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1997},
    Month = {Jul},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/3267.html},
    Number = {UCB/ERL M97/51}
}

EndNote citation:

%0 Report
%A Lee, I.
%T Understanding the Role of Mask and Resist in Line-End Shortening with Simulation
%I EECS Department, University of California, Berkeley
%D 1997
%@ UCB/ERL M97/51
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/3267.html
%F Lee:M97/51