Direct Aerial Image Monitoring for Extreme Ultraviolet Lithography Systems

Charles H. Fields

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M97/16
March 1997

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/ERL-97-16.pdf

Advisor: William G. Oldham

BibTeX citation:

@phdthesis{Fields:M97/16,
    Author = {Fields, Charles H.},
    Title = {Direct Aerial Image Monitoring for Extreme Ultraviolet Lithography Systems},
    School = {EECS Department, University of California, Berkeley},
    Year = {1997},
    Month = {Mar},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/3194.html},
    Number = {UCB/ERL M97/16}
}

EndNote citation:

%0 Thesis
%A Fields, Charles H.
%T Direct Aerial Image Monitoring for Extreme Ultraviolet Lithography Systems
%I EECS Department, University of California, Berkeley
%D 1997
%@ UCB/ERL M97/16
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1997/3194.html
%F Fields:M97/16