Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Direct Aerial Image Monitoring for Extreme Ultraviolet Lithography Systems

Charles H. Fields

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M97/16
1997

Advisor: William G. Oldham


BibTeX citation:

@phdthesis{Fields:M97/16,
    Author = {Fields, Charles H.},
    Title = {Direct Aerial Image Monitoring for Extreme Ultraviolet Lithography Systems},
    School = {EECS Department, University of California, Berkeley},
    Year = {1997},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1997/3194.html},
    Number = {UCB/ERL M97/16}
}

EndNote citation:

%0 Thesis
%A Fields, Charles H.
%T Direct Aerial Image Monitoring for Extreme Ultraviolet Lithography Systems
%I EECS Department, University of California, Berkeley
%D 1997
%@ UCB/ERL M97/16
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1997/3194.html
%F Fields:M97/16