Application of the Plasma Immersion Ion Implantation Coupled Plasma Model for Energy Spread and Oxide Charging
B.P. Linder
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M96/98
1996
BibTeX citation:
@techreport{Linder:M96/98,
Author = {Linder, B.P.},
Title = {Application of the Plasma Immersion Ion Implantation Coupled Plasma Model for Energy Spread and Oxide Charging},
Institution = {EECS Department, University of California, Berkeley},
Year = {1996},
URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1996/3151.html},
Number = {UCB/ERL M96/98}
}
EndNote citation:
%0 Report %A Linder, B.P. %T Application of the Plasma Immersion Ion Implantation Coupled Plasma Model for Energy Spread and Oxide Charging %I EECS Department, University of California, Berkeley %D 1996 %@ UCB/ERL M96/98 %U http://www.eecs.berkeley.edu/Pubs/TechRpts/1996/3151.html %F Linder:M96/98