Application of the Plasma Immersion Ion Implantation Coupled Plasma Model for Energy Spread and Oxide Charging

B.P. Linder

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M96/98
1996


BibTeX citation:

@techreport{Linder:M96/98,
    Author = {Linder, B.P.},
    Title = {Application of the Plasma Immersion Ion Implantation Coupled Plasma Model for Energy Spread and Oxide Charging},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1996},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1996/3151.html},
    Number = {UCB/ERL M96/98}
}

EndNote citation:

%0 Report
%A Linder, B.P.
%T Application of the Plasma Immersion Ion Implantation Coupled Plasma Model for Energy Spread and Oxide Charging
%I EECS Department, University of California, Berkeley
%D 1996
%@ UCB/ERL M96/98
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1996/3151.html
%F Linder:M96/98