Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Application of the Plasma Immersion Ion Implantation Coupled Plasma Model for Energy Spread and Oxide Charging

B.P. Linder

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M96/98
1996


BibTeX citation:

@techreport{Linder:M96/98,
    Author = {Linder, B.P.},
    Title = {Application of the Plasma Immersion Ion Implantation Coupled Plasma Model for Energy Spread and Oxide Charging},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1996},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1996/3151.html},
    Number = {UCB/ERL M96/98}
}

EndNote citation:

%0 Report
%A Linder, B.P.
%T Application of the Plasma Immersion Ion Implantation Coupled Plasma Model for Energy Spread and Oxide Charging
%I EECS Department, University of California, Berkeley
%D 1996
%@ UCB/ERL M96/98
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1996/3151.html
%F Linder:M96/98