Role of Etch Products in Polysilicon Etching in a High Density Chlorine Discharge
C. Lee, D.B. Graves and Michael A. Lieberman
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M95/9
1995
BibTeX citation:
@techreport{Lee:M95/9,
Author = {Lee, C. and Graves, D.B. and Lieberman, Michael A.},
Title = {Role of Etch Products in Polysilicon Etching in a High Density Chlorine Discharge},
Institution = {EECS Department, University of California, Berkeley},
Year = {1995},
URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1995/2712.html},
Number = {UCB/ERL M95/9}
}
EndNote citation:
%0 Report %A Lee, C. %A Graves, D.B. %A Lieberman, Michael A. %T Role of Etch Products in Polysilicon Etching in a High Density Chlorine Discharge %I EECS Department, University of California, Berkeley %D 1995 %@ UCB/ERL M95/9 %U http://www.eecs.berkeley.edu/Pubs/TechRpts/1995/2712.html %F Lee:M95/9