Frequency-Conversion Optics for 213-nm Optical Lithography Light Source
E. Tejnil
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M94/27
1994
BibTeX citation:
@techreport{Tejnil:M94/27,
Author = {Tejnil, E.},
Title = {Frequency-Conversion Optics for 213-nm Optical Lithography Light Source},
Institution = {EECS Department, University of California, Berkeley},
Year = {1994},
URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1994/2539.html},
Number = {UCB/ERL M94/27}
}
EndNote citation:
%0 Report %A Tejnil, E. %T Frequency-Conversion Optics for 213-nm Optical Lithography Light Source %I EECS Department, University of California, Berkeley %D 1994 %@ UCB/ERL M94/27 %U http://www.eecs.berkeley.edu/Pubs/TechRpts/1994/2539.html %F Tejnil:M94/27