# Two-Dimensional Electromagnetic Simulation of Topography Scattering and Diffraction for Optical Lithography

### A. Wong

###
EECS Department

University of California, Berkeley

Technical Report No. UCB/ERL M92/115

1992

### http://www.eecs.berkeley.edu/Pubs/TechRpts/1992/ERL-92-115.pdf

The time-domain finite-difference approach used by TEMPEST for electromagnetic scattering and diffraction simulation has been extended from the transverse electric (TE) polarization to the transverse magnetic (TM) polarization. The equations for the TM polarization have the same form as those of the TE polarization. Hence, simulation efficiencies (per iteration) of both polarizations are similar. Extension to off-axis incident analysis has also been made. Implementation of oblique incidence has included a synchronization between the analytically calculated sinusoidal forcing function and the propagated wave. With these two additional computing capabilities, a new version of the simulation program TEMPEST written in the programming language C* is available. This version is easier to use than the previous *lisp version. The improved program has been applied to the studying of polarization effects in mask transmission for different mask technologies. Future extensions of the program, to include three-dimensional and partial coherence effects, as well as analysis of propagation in highly dispersive materials, are also discussed.

BibTeX citation:

@techreport{Wong:M92/115, Author = {Wong, A.}, Title = {Two-Dimensional Electromagnetic Simulation of Topography Scattering and Diffraction for Optical Lithography}, Institution = {EECS Department, University of California, Berkeley}, Year = {1992}, URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1992/2190.html}, Number = {UCB/ERL M92/115}, Abstract = {The time-domain finite-difference approach used by TEMPEST for electromagnetic scattering and diffraction simulation has been extended from the transverse electric (TE) polarization to the transverse magnetic (TM) polarization. The equations for the TM polarization have the same form as those of the TE polarization. Hence, simulation efficiencies (per iteration) of both polarizations are similar. Extension to off-axis incident analysis has also been made. Implementation of oblique incidence has included a synchronization between the analytically calculated sinusoidal forcing function and the propagated wave. With these two additional computing capabilities, a new version of the simulation program TEMPEST written in the programming language C* is available. This version is easier to use than the previous *lisp version. The improved program has been applied to the studying of polarization effects in mask transmission for different mask technologies. Future extensions of the program, to include three-dimensional and partial coherence effects, as well as analysis of propagation in highly dispersive materials, are also discussed.} }

EndNote citation:

%0 Report %A Wong, A. %T Two-Dimensional Electromagnetic Simulation of Topography Scattering and Diffraction for Optical Lithography %I EECS Department, University of California, Berkeley %D 1992 %@ UCB/ERL M92/115 %U http://www.eecs.berkeley.edu/Pubs/TechRpts/1992/2190.html %F Wong:M92/115