Electron Cyclotron Resonance Etching of Silylated Photoresist

B. Lynch, S. Das, Michael A. Lieberman and D.W. Hess

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M92/25
1992


BibTeX citation:

@techreport{Lynch:M92/25,
    Author = {Lynch, B. and Das, S. and Lieberman, Michael A. and Hess, D.W.},
    Title = {Electron Cyclotron Resonance Etching of Silylated Photoresist},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1992},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1992/1980.html},
    Number = {UCB/ERL M92/25}
}

EndNote citation:

%0 Report
%A Lynch, B.
%A Das, S.
%A Lieberman, Michael A.
%A Hess, D.W.
%T Electron Cyclotron Resonance Etching of Silylated Photoresist
%I EECS Department, University of California, Berkeley
%D 1992
%@ UCB/ERL M92/25
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1992/1980.html
%F Lynch:M92/25