Electron Cyclotron Resonance Etching of Silylated Photoresist
B. Lynch, S. Das, Michael A. Lieberman and D.W. Hess
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M92/25
1992
BibTeX citation:
@techreport{Lynch:M92/25,
Author = {Lynch, B. and Das, S. and Lieberman, Michael A. and Hess, D.W.},
Title = {Electron Cyclotron Resonance Etching of Silylated Photoresist},
Institution = {EECS Department, University of California, Berkeley},
Year = {1992},
URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1992/1980.html},
Number = {UCB/ERL M92/25}
}
EndNote citation:
%0 Report %A Lynch, B. %A Das, S. %A Lieberman, Michael A. %A Hess, D.W. %T Electron Cyclotron Resonance Etching of Silylated Photoresist %I EECS Department, University of California, Berkeley %D 1992 %@ UCB/ERL M92/25 %U http://www.eecs.berkeley.edu/Pubs/TechRpts/1992/1980.html %F Lynch:M92/25