Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Fourth Quarterly Progress Report
Nathan W. Cheung, Michael A. Lieberman, C.A. Pico, R.A. Stewart, J. Tao, M.H. Kiang, C. Yu, V. Vahedi, B. Troyanovsky, W. En, E. Jones and J. Benasso
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M91/116
1991
BibTeX citation:
@techreport{Cheung:M91/116,
Author = {Nathan W. Cheung and Michael A. Lieberman and C.A. Pico and R.A. Stewart and J. Tao and M.H. Kiang and C. Yu and V. Vahedi and B. Troyanovsky and W. En and E. Jones and J. Benasso},
Title = {Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Fourth Quarterly Progress Report},
Institution = {EECS Department, University of California, Berkeley},
Year = {1991},
URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1911.html},
Number = {UCB/ERL M91/116}
}
EndNote citation:
%0 Report %A Cheung, Nathan W. %A Lieberman, Michael A. %A Pico, C.A. %A Stewart, R.A. %A Tao, J. %A Kiang, M.H. %A Yu, C. %A Vahedi, V. %A Troyanovsky, B. %A En, W. %A Jones, E. %A Benasso, J. %T Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Fourth Quarterly Progress Report %I EECS Department, University of California, Berkeley %D 1991 %@ UCB/ERL M91/116 %U http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1911.html %F Cheung:M91/116