Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Fourth Quarterly Progress Report

Nathan W. Cheung, Michael A. Lieberman, C.A. Pico, R.A. Stewart, J. Tao, M.H. Kiang, C. Yu, V. Vahedi, B. Troyanovsky, W. En, E. Jones and J. Benasso

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M91/116
1991


BibTeX citation:

@techreport{Cheung:M91/116,
    Author = {Cheung, Nathan W. and Lieberman, Michael A. and Pico, C.A. and Stewart, R.A. and Tao, J. and Kiang, M.H. and Yu, C. and Vahedi, V. and Troyanovsky, B. and En, W. and Jones, E. and Benasso, J.},
    Title = {Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Fourth Quarterly Progress Report},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1991},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1911.html},
    Number = {UCB/ERL M91/116}
}

EndNote citation:

%0 Report
%A Cheung, Nathan W.
%A Lieberman, Michael A.
%A Pico, C.A.
%A Stewart, R.A.
%A Tao, J.
%A Kiang, M.H.
%A Yu, C.
%A Vahedi, V.
%A Troyanovsky, B.
%A En, W.
%A Jones, E.
%A Benasso, J.
%T Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Fourth Quarterly Progress Report
%I EECS Department, University of California, Berkeley
%D 1991
%@ UCB/ERL M91/116
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1911.html
%F Cheung:M91/116