Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Plasma Etching of CVD Tungsten Using ECR Discharges

C. Lee, D.W. Hess and Michael A. Lieberman

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M91/92
1991


BibTeX citation:

@techreport{Lee:M91/92,
    Author = {Lee, C. and Hess, D.W. and Lieberman, Michael A.},
    Title = {Plasma Etching of CVD Tungsten Using ECR Discharges},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1991},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1851.html},
    Number = {UCB/ERL M91/92}
}

EndNote citation:

%0 Report
%A Lee, C.
%A Hess, D.W.
%A Lieberman, Michael A.
%T Plasma Etching of CVD Tungsten Using ECR Discharges
%I EECS Department, University of California, Berkeley
%D 1991
%@ UCB/ERL M91/92
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1851.html
%F Lee:M91/92