Plasma Etching of CVD Tungsten Using ECR Discharges
C. Lee, D.W. Hess and Michael A. Lieberman
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M91/92
1991
BibTeX citation:
@techreport{Lee:M91/92,
Author = {Lee, C. and Hess, D.W. and Lieberman, Michael A.},
Title = {Plasma Etching of CVD Tungsten Using ECR Discharges},
Institution = {EECS Department, University of California, Berkeley},
Year = {1991},
URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1851.html},
Number = {UCB/ERL M91/92}
}
EndNote citation:
%0 Report %A Lee, C. %A Hess, D.W. %A Lieberman, Michael A. %T Plasma Etching of CVD Tungsten Using ECR Discharges %I EECS Department, University of California, Berkeley %D 1991 %@ UCB/ERL M91/92 %U http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1851.html %F Lee:M91/92