Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Third Quarterly Progress Report
Michael A. Lieberman, Nathan W. Cheung, C.A. Pico, R.A. Stewart, J. Tao, M.H. Kiang, C. Yu, V. Vahedi, B. Troyanovsky, W. En, E. Jones and J. Benasso
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M91/86
1991
BibTeX citation:
@techreport{Lieberman:M91/86,
Author = {Michael A. Lieberman and Nathan W. Cheung and C.A. Pico and R.A. Stewart and J. Tao and M.H. Kiang and C. Yu and V. Vahedi and B. Troyanovsky and W. En and E. Jones and J. Benasso},
Title = {Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Third Quarterly Progress Report},
Institution = {EECS Department, University of California, Berkeley},
Year = {1991},
URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1822.html},
Number = {UCB/ERL M91/86}
}
EndNote citation:
%0 Report %A Lieberman, Michael A. %A Cheung, Nathan W. %A Pico, C.A. %A Stewart, R.A. %A Tao, J. %A Kiang, M.H. %A Yu, C. %A Vahedi, V. %A Troyanovsky, B. %A En, W. %A Jones, E. %A Benasso, J. %T Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Third Quarterly Progress Report %I EECS Department, University of California, Berkeley %D 1991 %@ UCB/ERL M91/86 %U http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1822.html %F Lieberman:M91/86