Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Investigation of Optical Phenomena in Photolithography and Optical Metrology Using Massively Parallel Simulation

K.H. Tadros

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M91/72
1991


BibTeX citation:

@techreport{Tadros:M91/72,
    Author = {Tadros, K.H.},
    Title = {Investigation of Optical Phenomena in Photolithography and Optical Metrology Using Massively Parallel Simulation},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1991},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1798.html},
    Number = {UCB/ERL M91/72}
}

EndNote citation:

%0 Report
%A Tadros, K.H.
%T Investigation of Optical Phenomena in Photolithography and Optical Metrology Using Massively Parallel Simulation
%I EECS Department, University of California, Berkeley
%D 1991
%@ UCB/ERL M91/72
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1798.html
%F Tadros:M91/72