Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Second Quarterly Progress Report

Michael A. Lieberman

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M91/63
1991


BibTeX citation:

@techreport{Lieberman:M91/63,
    Author = {Lieberman, Michael A.},
    Title = {Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Second Quarterly Progress Report},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1991},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1786.html},
    Number = {UCB/ERL M91/63}
}

EndNote citation:

%0 Report
%A Lieberman, Michael A.
%T Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing: Second Quarterly Progress Report
%I EECS Department, University of California, Berkeley
%D 1991
%@ UCB/ERL M91/63
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1786.html
%F Lieberman:M91/63