H-F. Guo
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M91/61
July 1991
http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/ERL-91-61.pdf
BibTeX citation:
@techreport{Guo:M91/61, Author = {Guo, H-F.}, Title = {Real-Time Statistical Process Control for Plasma Etching}, Institution = {EECS Department, University of California, Berkeley}, Year = {1991}, Month = {Jul}, URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1783.html}, Number = {UCB/ERL M91/61} }
EndNote citation:
%0 Report %A Guo, H-F. %T Real-Time Statistical Process Control for Plasma Etching %I EECS Department, University of California, Berkeley %D 1991 %@ UCB/ERL M91/61 %U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1991/1783.html %F Guo:M91/61