Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing

Michael A. Lieberman and Nathan W. Cheung

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M91/26
1991


BibTeX citation:

@techreport{Lieberman:M91/26,
    Author = {Lieberman, Michael A. and Cheung, Nathan W.},
    Title = {Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1991},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1724.html},
    Number = {UCB/ERL M91/26}
}

EndNote citation:

%0 Report
%A Lieberman, Michael A.
%A Cheung, Nathan W.
%T Plasma Immersion Ion Implantation (PIII) for Integrated Circuit Manufacturing
%I EECS Department, University of California, Berkeley
%D 1991
%@ UCB/ERL M91/26
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1991/1724.html
%F Lieberman:M91/26