Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Characterization of the Processing Plasma in an Engineering Prototype Reactor for Plasma Immersion Ion Implantation

R.A. Stewart, X.Y. Qian, D.A. Carl, B. Lake, J. Benasso, R. Lynch, C.A. Pico, Michael A. Lieberman and Nathan W. Cheung

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M90/100
1990


BibTeX citation:

@techreport{Stewart:M90/100,
    Author = {Stewart, R.A. and Qian, X.Y. and Carl, D.A. and Lake, B. and Benasso, J. and Lynch, R. and Pico, C.A. and Lieberman, Michael A. and Cheung, Nathan W.},
    Title = {Characterization of the Processing Plasma in an Engineering Prototype Reactor for Plasma Immersion Ion Implantation},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1990},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1990/1621.html},
    Number = {UCB/ERL M90/100}
}

EndNote citation:

%0 Report
%A Stewart, R.A.
%A Qian, X.Y.
%A Carl, D.A.
%A Lake, B.
%A Benasso, J.
%A Lynch, R.
%A Pico, C.A.
%A Lieberman, Michael A.
%A Cheung, Nathan W.
%T Characterization of the Processing Plasma in an Engineering Prototype Reactor for Plasma Immersion Ion Implantation
%I EECS Department, University of California, Berkeley
%D 1990
%@ UCB/ERL M90/100
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1990/1621.html
%F Stewart:M90/100