Plasma Immersion Ion Implantation for VLSI Fabrication
X.Y. Qian, Nathan W. Cheung and Michael A. Lieberman
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M90/84
1990
BibTeX citation:
@techreport{Qian:M90/84,
Author = {X.Y. Qian and Nathan W. Cheung and Michael A. Lieberman},
Title = {Plasma Immersion Ion Implantation for VLSI Fabrication},
Institution = {EECS Department, University of California, Berkeley},
Year = {1990},
URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1990/1589.html},
Number = {UCB/ERL M90/84}
}
EndNote citation:
%0 Report %A Qian, X.Y. %A Cheung, Nathan W. %A Lieberman, Michael A. %T Plasma Immersion Ion Implantation for VLSI Fabrication %I EECS Department, University of California, Berkeley %D 1990 %@ UCB/ERL M90/84 %U http://www.eecs.berkeley.edu/Pubs/TechRpts/1990/1589.html %F Qian:M90/84