Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Plasma Immersion Ion Implantation for VLSI Fabrication

X.Y. Qian, Nathan W. Cheung and Michael A. Lieberman

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M90/84
1990


BibTeX citation:

@techreport{Qian:M90/84,
    Author = {Qian, X.Y. and Cheung, Nathan W. and Lieberman, Michael A.},
    Title = {Plasma Immersion Ion Implantation for VLSI Fabrication},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1990},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1990/1589.html},
    Number = {UCB/ERL M90/84}
}

EndNote citation:

%0 Report
%A Qian, X.Y.
%A Cheung, Nathan W.
%A Lieberman, Michael A.
%T Plasma Immersion Ion Implantation for VLSI Fabrication
%I EECS Department, University of California, Berkeley
%D 1990
%@ UCB/ERL M90/84
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1990/1589.html
%F Qian:M90/84