Effects of Excimer Laser Radiation Properties on Condenser Illumination for Microlithography

W.N. Partlo

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M89/68
May 1989

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1989/ERL-89-68.pdf

BibTeX citation:

@techreport{Partlo:M89/68,
    Author = {Partlo, W.N.},
    Title = {Effects of Excimer Laser Radiation Properties on Condenser Illumination for Microlithography},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1989},
    Month = {May},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1989/1253.html},
    Number = {UCB/ERL M89/68}
}

EndNote citation:

%0 Report
%A Partlo, W.N.
%T Effects of Excimer Laser Radiation Properties on Condenser Illumination for Microlithography
%I EECS Department, University of California, Berkeley
%D 1989
%@ UCB/ERL M89/68
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1989/1253.html
%F Partlo:M89/68