Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

An Integrated Graphical Environment for Operating IC Process Simulators

A.S. Wong

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M89/67
1989

http://www.eecs.berkeley.edu/Pubs/TechRpts/1989/ERL-89-67.pdf

This report describes PROSE (PROcess Simulation Environment), an integrated environment for operating integrated-circuit process simulators. PROSE features a graphical user interface for displaying and editing layout and cross-sectional structures, interactive menus and dialog boxes for invoking simulation tools and entering process parameters, and a Profile Interchange Format for specifying device structure information. This environment is based on the VEM/OCT/RPC CAD system, and uses a new process manager named SIMPL-RPC (SIMulated Profiles from the Layout, Remote Procedure Call). Special attention has been placed on the development of the Profile Interchange Format (PIF). A parser has been implemented in SIMPL-RPC for reading and writing ASCII PIF files. SIMPL-RPC also has the ability to store and manipulate binary PIF data in the OCT database with a new library of data access functions and a policy which defines how PIF data is stored in OCT.


BibTeX citation:

@techreport{Wong:M89/67,
    Author = {Wong, A.S.},
    Title = {An Integrated Graphical Environment for Operating IC Process Simulators},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1989},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1989/1252.html},
    Number = {UCB/ERL M89/67},
    Abstract = {This report describes PROSE (PROcess Simulation Environment),
an integrated environment for operating integrated-circuit process
simulators.  PROSE features a graphical user interface for displaying
and editing layout and cross-sectional structures, interactive
menus and dialog boxes for invoking simulation tools and entering
process parameters, and a Profile Interchange Format for specifying
device structure information. This environment is based on the
VEM/OCT/RPC CAD system, and uses a new process manager named
SIMPL-RPC (SIMulated Profiles from the Layout, Remote Procedure
Call).

Special attention has been placed on the development of the Profile
Interchange Format (PIF). A parser has been implemented in SIMPL-RPC
for reading and writing ASCII PIF files. SIMPL-RPC also has the
ability to store and manipulate binary PIF data in the OCT database
with a new library of data access functions and a policy which
defines how PIF data is stored in OCT.}
}

EndNote citation:

%0 Report
%A Wong, A.S.
%T An Integrated Graphical Environment for Operating IC Process Simulators
%I EECS Department, University of California, Berkeley
%D 1989
%@ UCB/ERL M89/67
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1989/1252.html
%F Wong:M89/67