Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Test Structures for the Visual Characterization of Optical Lithography

Andrew R. Neureuther, William G. Oldham, R.C. Anderson, D.M. Drako, W.E. Haller, B. Huynh, D.E. Lyons, G.R. Misium, D.P. Sutija, K.K.H. Toh and B. Uathavikul

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M88/38
1988


BibTeX citation:

@techreport{Neureuther:M88/38,
    Author = {Neureuther, Andrew R. and Oldham, William G. and Anderson, R.C. and Drako, D.M. and Haller, W.E. and Huynh, B. and Lyons, D.E. and Misium, G.R. and Sutija, D.P. and Toh, K.K.H. and Uathavikul, B.},
    Title = {Test Structures for the Visual Characterization of Optical Lithography},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1988},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1988/1045.html},
    Number = {UCB/ERL M88/38}
}

EndNote citation:

%0 Report
%A Neureuther, Andrew R.
%A Oldham, William G.
%A Anderson, R.C.
%A Drako, D.M.
%A Haller, W.E.
%A Huynh, B.
%A Lyons, D.E.
%A Misium, G.R.
%A Sutija, D.P.
%A Toh, K.K.H.
%A Uathavikul, B.
%T Test Structures for the Visual Characterization of Optical Lithography
%I EECS Department, University of California, Berkeley
%D 1988
%@ UCB/ERL M88/38
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1988/1045.html
%F Neureuther:M88/38