Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Calibrated Exposure, Focus and Defect Test Patterns for Optical Lithography

B. Huynh

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M88/36
1988


BibTeX citation:

@techreport{Huynh:M88/36,
    Author = {Huynh, B.},
    Title = {Calibrated Exposure, Focus and Defect Test Patterns for Optical Lithography},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1988},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1988/1043.html},
    Number = {UCB/ERL M88/36}
}

EndNote citation:

%0 Report
%A Huynh, B.
%T Calibrated Exposure, Focus and Defect Test Patterns for Optical Lithography
%I EECS Department, University of California, Berkeley
%D 1988
%@ UCB/ERL M88/36
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1988/1043.html
%F Huynh:M88/36