Calibrated Exposure, Focus and Defect Test Patterns for Optical Lithography

B. Huynh

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M88/36
May 1988

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/ERL-88-36.pdf

BibTeX citation:

@techreport{Huynh:M88/36,
    Author = {Huynh, B.},
    Title = {Calibrated Exposure, Focus and Defect Test Patterns for Optical Lithography},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1988},
    Month = {May},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/1043.html},
    Number = {UCB/ERL M88/36}
}

EndNote citation:

%0 Report
%A Huynh, B.
%T Calibrated Exposure, Focus and Defect Test Patterns for Optical Lithography
%I EECS Department, University of California, Berkeley
%D 1988
%@ UCB/ERL M88/36
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1988/1043.html
%F Huynh:M88/36