Characterization of the Boron+ Planar Dopant Source Moisture Enhanced Process

R. Alley, P.K. Ko and K. Voros

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M86/75
September 1986

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1986/ERL-86-75.pdf

BibTeX citation:

@techreport{Alley:M86/75,
    Author = {Alley, R. and Ko, P.K. and Voros, K.},
    Title = {Characterization of the Boron+ Planar Dopant Source Moisture Enhanced Process},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1986},
    Month = {Sep},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1986/753.html},
    Number = {UCB/ERL M86/75}
}

EndNote citation:

%0 Report
%A Alley, R.
%A Ko, P.K.
%A Voros, K.
%T Characterization of the Boron+ Planar Dopant Source Moisture Enhanced Process
%I EECS Department, University of California, Berkeley
%D 1986
%@ UCB/ERL M86/75
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1986/753.html
%F Alley:M86/75