Simulation of Developed Resist Profiles for Masked Ion Beam Lithography (MIBL)

G.M. Atkinson

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M85/51
1985

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BibTeX citation:

@techreport{Atkinson:M85/51,
    Author = {Atkinson, G.M.},
    Title = {Simulation of Developed Resist Profiles for Masked Ion Beam Lithography (MIBL)},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1985},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1985/527.html},
    Number = {UCB/ERL M85/51}
}

EndNote citation:

%0 Report
%A Atkinson, G.M.
%T Simulation of Developed Resist Profiles for Masked Ion Beam Lithography (MIBL)
%I EECS Department, University of California, Berkeley
%D 1985
%@ UCB/ERL M85/51
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1985/527.html
%F Atkinson:M85/51

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