Simulation of Developed Resist Profiles for Masked Ion Beam Lithography (MIBL)

G.M. Atkinson

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M85/51
June 1985

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1985/ERL-85-51.pdf

BibTeX citation:

@techreport{Atkinson:M85/51,
    Author = {Atkinson, G.M.},
    Title = {Simulation of Developed Resist Profiles for Masked Ion Beam Lithography (MIBL)},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1985},
    Month = {Jun},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1985/527.html},
    Number = {UCB/ERL M85/51}
}

EndNote citation:

%0 Report
%A Atkinson, G.M.
%T Simulation of Developed Resist Profiles for Masked Ion Beam Lithography (MIBL)
%I EECS Department, University of California, Berkeley
%D 1985
%@ UCB/ERL M85/51
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1985/527.html
%F Atkinson:M85/51