Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Simulation of Developed Resist Profiles for Masked Ion Beam Lithography (MIBL)

G.M. Atkinson

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M85/51
1985


BibTeX citation:

@techreport{Atkinson:M85/51,
    Author = {Atkinson, G.M.},
    Title = {Simulation of Developed Resist Profiles for Masked Ion Beam Lithography (MIBL)},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1985},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1985/527.html},
    Number = {UCB/ERL M85/51}
}

EndNote citation:

%0 Report
%A Atkinson, G.M.
%T Simulation of Developed Resist Profiles for Masked Ion Beam Lithography (MIBL)
%I EECS Department, University of California, Berkeley
%D 1985
%@ UCB/ERL M85/51
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1985/527.html
%F Atkinson:M85/51