Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Additions to the Imaging Capability of SAMPLE

M.D. Prouty

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M84/111
1984

http://www.eecs.berkeley.edu/Pubs/TechRpts/1984/ERL-84-111.pdf

As feature sizes decrease in optical lithography, becoming smaller than the ratio of wavelength to numerical aperture, the faithfulness of imaging is significantly reduced. This makes computer simulations of optical lithography more difficult, first of all because more general techniques, such as phase shift masks, are being used to improve the image and secondly because the differences between 1 dimensional and 2 dimensional patterns, such as line end shortening and rounding of square apertures, are more important. Therefore, the capabilities of imaging phase shifting masks and 2 dimensional masks have been added to the processing simulation program SAMPLE. The second chapter of this paper outlines the details of the changes this author made in the program to calculate images of phase shift masks. The next chapter outlines some results obtained using the new program. The fourth chapter outlines the use of the 2-D code written by Shankar Subramanian. Since this work was never documented or implemented in the SAMPLE program this chapter will serve as a user's manual for 2-D imaging.


BibTeX citation:

@techreport{Prouty:M84/111,
    Author = {Prouty, M.D.},
    Title = {Additions to the Imaging Capability of SAMPLE},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1984},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1984/436.html},
    Number = {UCB/ERL M84/111},
    Abstract = {As feature sizes decrease in optical lithography, becoming smaller
than the ratio of wavelength to numerical aperture, the
faithfulness of imaging is significantly reduced.  This makes
computer simulations of optical lithography more difficult, first of
all because more general techniques, such as phase shift masks, are
being used to improve the image and secondly because the differences
between 1 dimensional and 2 dimensional patterns, such as line end
shortening and rounding of square apertures, are more important.
Therefore, the capabilities of imaging phase shifting masks and
2 dimensional masks have been added to the processing simulation
program SAMPLE.

The second chapter of this paper outlines the details of the changes
this author made in the program to calculate images of phase shift
masks. The next chapter outlines some results obtained using the
new program.  The fourth chapter outlines the use of the 2-D code
written by Shankar Subramanian.  Since this work was never documented
or implemented in the SAMPLE program this chapter will serve as a
user's manual for 2-D imaging.}
}

EndNote citation:

%0 Report
%A Prouty, M.D.
%T Additions to the Imaging Capability of SAMPLE
%I EECS Department, University of California, Berkeley
%D 1984
%@ UCB/ERL M84/111
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1984/436.html
%F Prouty:M84/111