Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Proximity Exposure Studies in Electron Beam Lithography

P.R. Deshmukh

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M84/69
1984


BibTeX citation:

@techreport{Deshmukh:M84/69,
    Author = {Deshmukh, P.R.},
    Title = {Proximity Exposure Studies in Electron Beam Lithography},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1984},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1984/364.html},
    Number = {UCB/ERL M84/69}
}

EndNote citation:

%0 Report
%A Deshmukh, P.R.
%T Proximity Exposure Studies in Electron Beam Lithography
%I EECS Department, University of California, Berkeley
%D 1984
%@ UCB/ERL M84/69
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1984/364.html
%F Deshmukh:M84/69