Proximity Exposure Studies in Electron Beam Lithography

P.R. Deshmukh

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M84/69
September 1984

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1984/ERL-m-84-69.pdf

BibTeX citation:

@techreport{Deshmukh:M84/69,
    Author = {Deshmukh, P.R.},
    Title = {Proximity Exposure Studies in Electron Beam Lithography},
    Institution = {EECS Department, University of California, Berkeley},
    Year = {1984},
    Month = {Sep},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1984/364.html},
    Number = {UCB/ERL M84/69}
}

EndNote citation:

%0 Report
%A Deshmukh, P.R.
%T Proximity Exposure Studies in Electron Beam Lithography
%I EECS Department, University of California, Berkeley
%D 1984
%@ UCB/ERL M84/69
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1984/364.html
%F Deshmukh:M84/69