Characterization of Plasma Etched Structures in IC Processing
John L. Reynolds
EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M83/78
1983
Advisor: Andrew R. Neureuther and William G. Oldham
BibTeX citation:
@phdthesis{Reynolds:M83/78,
Author = {Reynolds, John L.},
Title = {Characterization of Plasma Etched Structures in IC Processing},
School = {EECS Department, University of California, Berkeley},
Year = {1983},
URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1983/237.html},
Number = {UCB/ERL M83/78}
}
EndNote citation:
%0 Thesis %A Reynolds, John L. %T Characterization of Plasma Etched Structures in IC Processing %I EECS Department, University of California, Berkeley %D 1983 %@ UCB/ERL M83/78 %U http://www.eecs.berkeley.edu/Pubs/TechRpts/1983/237.html %F Reynolds:M83/78