Electrical Engineering
      and Computer Sciences

Electrical Engineering and Computer Sciences

COLLEGE OF ENGINEERING

UC Berkeley

Characterization of Plasma Etched Structures in IC Processing

John L. Reynolds

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M83/78
1983

Advisor: Andrew R. Neureuther and William G. Oldham


BibTeX citation:

@phdthesis{Reynolds:M83/78,
    Author = {Reynolds, John L.},
    Title = {Characterization of Plasma Etched Structures in IC Processing},
    School = {EECS Department, University of California, Berkeley},
    Year = {1983},
    URL = {http://www.eecs.berkeley.edu/Pubs/TechRpts/1983/237.html},
    Number = {UCB/ERL M83/78}
}

EndNote citation:

%0 Thesis
%A Reynolds, John L.
%T Characterization of Plasma Etched Structures in IC Processing
%I EECS Department, University of California, Berkeley
%D 1983
%@ UCB/ERL M83/78
%U http://www.eecs.berkeley.edu/Pubs/TechRpts/1983/237.html
%F Reynolds:M83/78