Characterization of Plasma Etched Structures in IC Processing

John L. Reynolds

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M83/78
June 1983

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1983/ERL-m-83-78.pdf

Advisor: Andrew R. Neureuther and William G. Oldham

BibTeX citation:

@phdthesis{Reynolds:M83/78,
    Author = {Reynolds, John L.},
    Title = {Characterization of Plasma Etched Structures in IC Processing},
    School = {EECS Department, University of California, Berkeley},
    Year = {1983},
    Month = {Jun},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1983/237.html},
    Number = {UCB/ERL M83/78}
}

EndNote citation:

%0 Thesis
%A Reynolds, John L.
%T Characterization of Plasma Etched Structures in IC Processing
%I EECS Department, University of California, Berkeley
%D 1983
%@ UCB/ERL M83/78
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1983/237.html
%F Reynolds:M83/78