Simulation of Developed Resist Profiles for Electron-Beam Lithography

Michael G. Rosenfield

EECS Department
University of California, Berkeley
Technical Report No. UCB/ERL M81/40
June 1981

http://www2.eecs.berkeley.edu/Pubs/TechRpts/1981/ERL-m-81-40.pdf

A program for the simulation of the time evolution of two dimensional electron-beam exposed resist profiles is presented. The implementation of an electron-beam machine in the user oriented computer program for the Simulation and Modeling of Profiles in Lithography and Etching (SAMPLE) is discussed. Complete software documentation as well as a study of new electron-beam writing strategies and resist development effects are included.

Advisor: Andrew R. Neureuther

BibTeX citation:

@mastersthesis{Rosenfield:M81/40,
    Author = {Rosenfield, Michael G.},
    Title = {Simulation of Developed Resist Profiles for Electron-Beam Lithography},
    School = {EECS Department, University of California, Berkeley},
    Year = {1981},
    Month = {Jun},
    URL = {http://www2.eecs.berkeley.edu/Pubs/TechRpts/1981/9612.html},
    Number = {UCB/ERL M81/40},
    Abstract = {A program for the simulation of the time evolution of two
dimensional electron-beam exposed resist profiles is presented.
The implementation of an electron-beam machine in the user oriented
computer program for the Simulation and Modeling of Profiles in
Lithography and Etching (SAMPLE) is discussed.  Complete software
documentation as well as a study of new electron-beam writing
strategies and resist development effects are included.}
}

EndNote citation:

%0 Thesis
%A Rosenfield, Michael G.
%T Simulation of Developed Resist Profiles for Electron-Beam Lithography
%I EECS Department, University of California, Berkeley
%D 1981
%@ UCB/ERL M81/40
%U http://www2.eecs.berkeley.edu/Pubs/TechRpts/1981/9612.html
%F Rosenfield:M81/40